Levi Patterson lifts the lid on the sophisticated 3D-to-factory platform he's built that enables personalized designs for ...
Abstract: Aiming at the problems of long computing time and poor registration accuracy in current point cloud registration, an improved ICP algorithm based on matching point pair secondary filtering ...
Abstract: Inductively coupled plasma (ICP) etching has been replacing conventional reactive ion etching (RIE) for GaAs backside via etching to provide low inductance grounding in microwave devices ...
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